| 000 | 00878nam a22002417a 4500 | ||
|---|---|---|---|
| 999 |
_c48321 _d48321 |
||
| 001 | 2962 | ||
| 003 | OSt | ||
| 005 | 20161104144010.0 | ||
| 007 | ta | ||
| 008 | 150923b xxu||||| |||| 00| 0 eng d | ||
| 020 | _a1402006748 | ||
| 041 | _aeng | ||
| 082 |
_a621.3812 _bK87 |
||
| 100 |
_aKotrla, Miroslav _910828 |
||
| 245 |
_aAtomistic aspects of epitaxial growth / _cMiroslav Kotrla |
||
| 260 |
_aNetherlands : _bKluwwer Academics Publishers, _c2001 |
||
| 300 | _a604 p. | ||
| 505 | _a1. Adatom, vacancy, and dimer diffusion 2. Island nucleation and multilayer growth 3. Vicinal and patterned substrates 4. Heteroepitaxy, strain relaxation, and quantum dots 5. Multi-component systems | ||
| 650 |
_aSemiconductors _97680 |
||
| 650 |
_aThin Films, Multilayered _910835 |
||
| 700 |
_aPapnicolaou, Nicolas I.; Vvedensky, Dimitri D.; Wille, Luc T. _910829 |
||
| 942 |
_2ddc _cLOPT |
||