Coburn, J. W.
Plasma etching and reactive ion etching / J. W. Coburn - New York : American Institute of Physics, 1982 - 87 p.
1. Introduction 2. Apparatus, terminology and parameters 3. The reactive gas glow discharge 4. Gas-Surface chemistry 5. Glow discharge process 6. The etching of aluminum 7. Plasma diagnostics and process control 8. Apparatus considetations.
Semiconductors
Etching
621.381 / O658
Plasma etching and reactive ion etching / J. W. Coburn - New York : American Institute of Physics, 1982 - 87 p.
1. Introduction 2. Apparatus, terminology and parameters 3. The reactive gas glow discharge 4. Gas-Surface chemistry 5. Glow discharge process 6. The etching of aluminum 7. Plasma diagnostics and process control 8. Apparatus considetations.
Semiconductors
Etching
621.381 / O658
- Add to your cart
-
Código QR
