Plasma etching and reactive ion etching / J. W. Coburn
Material type:![Text](/opac-tmpl/lib/famfamfam/BK.png)
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Contents:
1. Introduction 2. Apparatus, terminology and parameters 3. The reactive gas glow discharge 4. Gas-Surface chemistry 5. Glow discharge process 6. The etching of aluminum 7. Plasma diagnostics and process control 8. Apparatus considetations.
Item type | Current location | Collection | Call number | Copy number | Status | Date due | Barcode |
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Laboratorio de Optoelectrónica GENERAL | Papel | 621.381 O658 (Browse shelf) | Ej. 1 | Available | L000536 |
1. Introduction 2. Apparatus, terminology and parameters 3. The reactive gas glow discharge 4. Gas-Surface chemistry 5. Glow discharge process 6. The etching of aluminum 7. Plasma diagnostics and process control 8. Apparatus considetations.
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